BUFFALO, N.Y. — University at Buffalo researchers have received a $1 million National Science Foundation (NSF) grant to help fund the purchase of a new 100-kilovolt electron beam lithography (EBL) ...
In a milestone for the global semiconductor industry, Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better. Their new ...
What Is Electron Beam Lithography? Electron beam lithography (EBL) is a technique for creating high-resolution patterns on a semiconductor substrate by directing a beam of electrons to selectively ...
BLOOMINGTON, Minn. & SANTA CLARA, Calif.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT) announced today that it has received from Multibeam Corp., a first-of-a-kind Multicolumn E-Beam ...
EurekAlert! - Metasurfaces, ultra-compact optical devices capable of "precisely manipulating light," have shown great potential in augmented reality (AR) glasses, holographic projection, biosensing, ...
Southampton, UK --With the exception of Japan, the University of Southampton will be the home to the world’s highest Accelerating Voltage Direct Writing Electron Beam Lithography (EBL) System. The ...
A new technical paper titled “Sensitivity and contrast of indium nitrate hydrate resist evaluated by low-energy electron beam and extreme ultraviolet exposure” was published by researchers at UT ...
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