Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
High-Level Synthesis (HLS) has emerged as a pivotal technology in the transformation of algorithmic descriptions into efficient hardware designs. Coupled with Design Space Exploration (DSE), HLS ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback